Hollow oval magnetron for large-area low-energy ions

Lin I, Ming Shing Wu

研究成果: 雜誌貢獻期刊論文同行評審

11 引文 斯高帕斯(Scopus)

摘要

A novel device, the "hollow oval magnetron," was designed and characterized. The device has a hollow electrode with an oval cross section. It sustains a large-area uniform plasma with low-energy ions under low pressure and moderate rf power (Ni ∼1011 cm -3, Γi ∼0.5 mA/cm2, E i ∼30 eV, and P∼5 mTorr). The energy distribution of ion current onto the hollow electrode has a broad spread ΔEii ∼1 in the rf mode, and a narrow peak ΔE i/ Ēi ∼0.1 with a low-energy tail in the dc mode. The device is a good candidate for low-energy high-rate plasma-material processing.

原文???core.languages.en_GB???
頁(從 - 到)1949-1951
頁數3
期刊Journal of Applied Physics
60
發行號6
DOIs
出版狀態已出版 - 1986

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