High-quality AlN grown with a single substrate temperature below 1200 °c

Keyphrases

• Substrate Temperature 100%
• Single Substrate 100%
• Three-dimensional (3D) 50%
• Metal-organic Chemical Vapor Deposition (MOCVD) 50%
• Adatoms 50%
• Epitaxial Structure 50%
• Flow Condition 50%
• Nanoislands 50%
• Lateral Migration 50%
• Lattice Strain 50%
• Peak Width 50%
• Growth Techniques 50%
• Atomically Flat Surface 50%
• Buffer Structure 50%
• AlN Layer 50%

Engineering

• Substrate Temperature 100%
• Metal Organic Chemical Vapor Deposition 50%
• Simplifies 50%
• Flow Condition 50%
• Flat Surface 50%

Material Science

• Aluminum Nitride 100%
• Surface (Surface Science) 66%
• X-Ray Diffraction 33%
• Metal-Organic Chemical Vapor Deposition 33%