High dislocation density of tin induced by electric current

Yi Han Liao; Chien Lung Liang; Kwang Lung Lin; Albert T. Wu

doi:10.1063/1.4937909

High dislocation density of tin induced by electric current

Yi Han Liao, Chien Lung Liang, Kwang Lung Lin, Albert T. Wu

化學工程與材料工程學系

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

30 引文斯高帕斯（Scopus）

摘要

A dislocation density of as high as 10¹⁷ /m² in a tin strip, as revealed by high resolution transmission electron microscope, was induced by current stressing at 6.5 x 10³ A/ cm². The dislocations exist in terms of dislocation line, dislocation loop, and dislocation aggregates. Electron Backscattered Diffraction images reflect that the high dislocation density induced the formation of low deflection angle subgrains, high deflection angle Widmanstätten grains, and recrystallization. The recrystallization gave rise to grain refining.

原文	???core.languages.en_GB???
文章編號	127210
期刊	AIP Advances
卷	5
發行號	12
DOIs	https://doi.org/10.1063/1.4937909
出版狀態	已出版 - 1 12月 2015

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10.1063/1.4937909

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AB - A dislocation density of as high as 1017 /m2 in a tin strip, as revealed by high resolution transmission electron microscope, was induced by current stressing at 6.5 x 103 A/ cm2. The dislocations exist in terms of dislocation line, dislocation loop, and dislocation aggregates. Electron Backscattered Diffraction images reflect that the high dislocation density induced the formation of low deflection angle subgrains, high deflection angle Widmanstätten grains, and recrystallization. The recrystallization gave rise to grain refining.

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High dislocation density of tin induced by electric current

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