High-aspect-ratio sub-diffraction-limit objects fabricated with two-photon-absorption photopolymerization

Ying Ja Chen; Yi Chun Chen; Chau Hwang Lee; Jyhpyng Wang

High-aspect-ratio sub-diffraction-limit objects fabricated with two-photon-absorption photopolymerization

Ying Ja Chen, Yi Chun Chen, Chau Hwang Lee, Jyhpyng Wang

物理學系

研究成果: 會議貢獻類型 › 會議論文 › 同行評審

2 引文斯高帕斯（Scopus）

摘要

High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35% the diffraction limit and an aspect ratio close to 4 were produced.

原文	???core.languages.en_GB???
頁面	252-253
頁數	2
出版狀態	已出版 - 2002
事件	Conference on Lasers and Electro-Optics (CLEO 2002) - Long Beach, CA, United States 持續時間: 19 5月 2002 → 24 5月 2002

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???event.eventtypes.event.conference???	Conference on Lasers and Electro-Optics (CLEO 2002)
國家/地區	United States
城市	Long Beach, CA
期間	19/05/02 → 24/05/02

引用此

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AU - Chen, Ying Ja

AU - Chen, Yi Chun

AU - Lee, Chau Hwang

AU - Wang, Jyhpyng

PY - 2002

Y1 - 2002

N2 - High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35% the diffraction limit and an aspect ratio close to 4 were produced.

AB - High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35% the diffraction limit and an aspect ratio close to 4 were produced.

UR - http://www.scopus.com/inward/record.url?scp=0036459501&partnerID=8YFLogxK

M3 - 會議論文

AN - SCOPUS:0036459501

SP - 252

EP - 253

T2 - Conference on Lasers and Electro-Optics (CLEO 2002)

Y2 - 19 May 2002 through 24 May 2002

ER -

High-aspect-ratio sub-diffraction-limit objects fabricated with two-photon-absorption photopolymerization

摘要

???event.eventtypes.event.conference???

指紋

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