High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35% the diffraction limit and an aspect ratio close to 4 were produced.
|出版狀態||已出版 - 2002|
|事件||Conference on Lasers and Electro-Optics (CLEO 2002) - Long Beach, CA, United States|
持續時間: 19 5月 2002 → 24 5月 2002
|???event.eventtypes.event.conference???||Conference on Lasers and Electro-Optics (CLEO 2002)|
|城市||Long Beach, CA|
|期間||19/05/02 → 24/05/02|