Ge/IIIV fin field-effect transistor common gate process and numerical simulations

Bo Yuan Chen, Jiann Lin Chen, Chun Lin Chu, Guang Li Luo, Shyong Lee, Edward Yi Chang

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

指紋

深入研究「Ge/IIIV fin field-effect transistor common gate process and numerical simulations」主題。共同形成了獨特的指紋。

Keyphrases

Engineering

Material Science

Chemical Engineering