@inproceedings{beddca716dad4a8b81e78acdfc732493,
title = "FTO films deposited in transition and oxide modes by magnetron sputtering using Sn metal target",
abstract = "Fluorine doped tin oxide (FTO) films were prepared by a pulse DC magnetron sputtering method with a metal Sn target. FTO films were deposited under two different modes to evaluate their respective optical and electrical properties. In the transition mode, the lowest resistivity of the FTO film was 1.63×10-3 Ω-cm with the average transmittance of 80 % in visible region. Furthermore, FTO films deposited in the oxide mode and mixed simultaneously with H2 could achieve even better resistivity lower to 8.42×10-4 Ω-cm and the higher average transmittance up to 81.08 % in visible region.",
author = "Liao, {Bo Huei} and Chan, {Shih Hao} and Lee, {Cheng Chung} and Chen, {Sheng Hui} and Donyau Chiang",
year = "2013",
language = "???core.languages.en_GB???",
isbn = "9781557529701",
series = "Optics InfoBase Conference Papers",
booktitle = "Optical Interference Coatings, OIC 2013",
note = "Optical Interference Coatings, OIC 2013 ; Conference date: 16-06-2013 Through 21-06-2013",
}