Formation of SiGe Nanorod arrays by combining nanoshpere lithography and Au-assisted chemical etching

C. H. Lai, Y. J. Lee, P. H. Yeh, S. W. Lee

研究成果: 書貢獻/報告類型會議論文篇章同行評審

摘要

SiGe Nanorod (NR) arrays have been fabricated by combining nanosphere lithography and Au-assisted chemical etching. With controlling the etching rate and duration, the length of SiGe NRs can be tuned from 300 nm to 1μnm. The morphology of SiGe NRs dramatically changed at different operating temperature. The results show a strong temperature dependence on fabrication of SiGe NRs. With TEM and SEM analysis, this work provides an effective approach to design the low-dimensional SiGe-based nanostructures for possible applications

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主出版物標題4th IEEE International NanoElectronics Conference, INEC 2011
DOIs
出版狀態已出版 - 2011
事件4th IEEE International Nanoelectronics Conference, INEC 2011 - Tao-Yuan, Taiwan
持續時間: 21 6月 201124 6月 2011

出版系列

名字Proceedings - International NanoElectronics Conference, INEC
ISSN(列印)2159-3523

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???event.eventtypes.event.conference???4th IEEE International Nanoelectronics Conference, INEC 2011
國家/地區Taiwan
城市Tao-Yuan
期間21/06/1124/06/11

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