Fabrication of high-NA GaN diffractive microlenses

Chii Chang Chen; Ming Hung Li; Chih Yang Chang; Gou Chung Chi; Jenq Yang Chang; Wei Tai Cheng; Jui Hung Yeh; Chuck Wu

doi:10.1109/OMEMS.2002.1031446

Fabrication of high-NA GaN diffractive microlenses

Chii Chang Chen, Ming Hung Li, Chih Yang Chang, Gou Chung Chi, Jenq Yang Chang, Wei Tai Cheng, Jui Hung Yeh, Chuck Wu

光電科學與工程學系

研究成果: 書貢獻/報告類型 › 會議論文篇章 › 同行評審

2 引文斯高帕斯（Scopus）

摘要

We present the fabrication of the high-numerical-aperture GaN diffractive microlenses by gray-level mask and inductively coupled plasma etching. (NA=0.85) The microlenses were designed for the application of high-density optical data storage. The advantage of using GaN as the material of the diffractive microlenses is discussed.

原文	???core.languages.en_GB???
主出版物標題	2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest
發行者	Institute of Electrical and Electronics Engineers Inc.
頁面	67-68
頁數	2
ISBN（電子）	0780375955, 9780780375956
DOIs	https://doi.org/10.1109/OMEMS.2002.1031446
出版狀態	已出版 - 2002
事件	IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Lugano, Switzerland 持續時間: 20 8月 2002 → 23 8月 2002

出版系列

名字	2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest

???event.eventtypes.event.conference???

???event.eventtypes.event.conference???	IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002
國家/地區	Switzerland
城市	Lugano
期間	20/08/02 → 23/08/02

存取文件

10.1109/OMEMS.2002.1031446

引用此

Chen, C. C., Li, M. H., Chang, C. Y., Chi, G. C., Chang, J. Y., Cheng, W. T., Yeh, J. H., & Wu, C. (2002). Fabrication of high-NA GaN diffractive microlenses. 於 2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest (頁 67-68). 文章 1031446 (2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/OMEMS.2002.1031446

@inproceedings{4c77ebdfce264973a0f2df8a084b98b5,

title = "Fabrication of high-NA GaN diffractive microlenses",

abstract = "We present the fabrication of the high-numerical-aperture GaN diffractive microlenses by gray-level mask and inductively coupled plasma etching. (NA=0.85) The microlenses were designed for the application of high-density optical data storage. The advantage of using GaN as the material of the diffractive microlenses is discussed.",

author = "Chen, {Chii Chang} and Li, {Ming Hung} and Chang, {Chih Yang} and Chi, {Gou Chung} and Chang, {Jenq Yang} and Cheng, {Wei Tai} and Yeh, {Jui Hung} and Chuck Wu",

note = "Publisher Copyright: {\textcopyright} 2002 IEEE.; IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 ; Conference date: 20-08-2002 Through 23-08-2002",

year = "2002",

doi = "10.1109/OMEMS.2002.1031446",

language = "???core.languages.en_GB???",

series = "2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

pages = "67--68",

booktitle = "2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest",

}

Chen, CC, Li, MH, Chang, CY, Chi, GC, Chang, JY, Cheng, WT, Yeh, JH & Wu, C 2002, Fabrication of high-NA GaN diffractive microlenses. 於 2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest., 1031446, 2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest, Institute of Electrical and Electronics Engineers Inc., 頁 67-68, IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002, Lugano, Switzerland, 20/08/02. https://doi.org/10.1109/OMEMS.2002.1031446

Fabrication of high-NA GaN diffractive microlenses. / Chen, Chii Chang; Li, Ming Hung; Chang, Chih Yang 等.
2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest. Institute of Electrical and Electronics Engineers Inc., 2002. p. 67-68 1031446 (2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest).

研究成果: 書貢獻/報告類型 › 會議論文篇章 › 同行評審

TY - GEN

T1 - Fabrication of high-NA GaN diffractive microlenses

AU - Chen, Chii Chang

AU - Li, Ming Hung

AU - Chang, Chih Yang

AU - Chi, Gou Chung

AU - Chang, Jenq Yang

AU - Cheng, Wei Tai

AU - Yeh, Jui Hung

AU - Wu, Chuck

PY - 2002

Y1 - 2002

N2 - We present the fabrication of the high-numerical-aperture GaN diffractive microlenses by gray-level mask and inductively coupled plasma etching. (NA=0.85) The microlenses were designed for the application of high-density optical data storage. The advantage of using GaN as the material of the diffractive microlenses is discussed.

AB - We present the fabrication of the high-numerical-aperture GaN diffractive microlenses by gray-level mask and inductively coupled plasma etching. (NA=0.85) The microlenses were designed for the application of high-density optical data storage. The advantage of using GaN as the material of the diffractive microlenses is discussed.

UR - http://www.scopus.com/inward/record.url?scp=84963720625&partnerID=8YFLogxK

U2 - 10.1109/OMEMS.2002.1031446

DO - 10.1109/OMEMS.2002.1031446

M3 - 會議論文篇章

AN - SCOPUS:84963720625

T3 - 2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest

SP - 67

EP - 68

BT - 2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002

Y2 - 20 August 2002 through 23 August 2002

ER -

Chen CC, Li MH, Chang CY, Chi GC, Chang JY, Cheng WT 等. Fabrication of high-NA GaN diffractive microlenses. 於 2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest. Institute of Electrical and Electronics Engineers Inc. 2002. p. 67-68. 1031446. (2002 IEEE/LEOS International Conference on Optical MEMs, OMEMS 2002 - Conference Digest). doi: 10.1109/OMEMS.2002.1031446

Fabrication of high-NA GaN diffractive microlenses

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