Fabrication of autocloned photonic crystals by using electron-beam gun with ion-assisted deposition

Te Hung Chang, Sheng Hui Chen, Chien Cheng Kuo, Cheng Chung Lee

研究成果: 書貢獻/報告類型會議論文篇章同行評審

摘要

Autocloning technique is an attractive deposition method to make photonic crystals since it can produce various photonic crystals by changing the substrate periodicity and the structure of the stacking materials. We report a novel method to fabricate autocloned photonic crystals. This method has better step-coverage, higher deposition rate and large deposition area than the sputtering method. We successfully preserved the periodic surface corrugation after the deposition of multilayer stacks by using an E-beam gun evaporation with ion-assisted deposition (IAD). Freedoms of the shaping process can be controlled by the power of IAD and the time of the ion source etching. The ion source etching is a physical etching process without any chemical reaction and dangerously reactive gas. The process parameters were described in this paper. During the deposition process, the refractive index can be adjusted by changing the deposition rate and the substrate temperature. The deposition rate was about 0.7-1 nm/s for SiO2 which is almost ten times faster than the sputtering method. So this method is good for the mass production of photonic crystals.

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主出版物標題Nanoengineering
主出版物子標題Fabrication, Properties, Optics, and Devices III
DOIs
出版狀態已出版 - 2006
事件Nanoengineering: Fabrication, Properties, Optics, and Devices III - San Diego, CA, United States
持續時間: 15 8月 200617 8月 2006

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
6327
ISSN(列印)0277-786X

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???event.eventtypes.event.conference???Nanoengineering: Fabrication, Properties, Optics, and Devices III
國家/地區United States
城市San Diego, CA
期間15/08/0617/08/06

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