Fabrication and enhanced field emission properties of novel silicon nanostructures

Srikanth Ravipati, Chang Jung Kuo, Jiann Shieh, Cheng Tung Chou, Fu Hsiang Ko

研究成果: 雜誌貢獻期刊論文同行評審

14 引文 斯高帕斯(Scopus)


We reported the fabrication and the field emission properties of two-tier novel silicon nanostructures. First, silicon nanopillars with ordered high aspect ratio were achieved by using conventional lithographic techniques to act as the field emission sources. Second, sharp-edged well-aligned silicon nanograss was fabricated on top of the nanopillars by means of hydrogen plasma dry etching to induce the field emission characteristics. The turn-on fields were obtained as 10.5 and 14.4 V/μm under current density of 0.01 mA/cm 2 for two-tier patterns separated by respective 5 μm and 2 μm spaces. The excellent field emission property from these novel nanostructures exhibited a great potential as high-performance field emitter arrays towards future nanoelectronic devices.

頁(從 - 到)1973-1976
期刊Microelectronics Reliability
出版狀態已出版 - 12月 2010


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