Fabrication and characterization of self-aligned InAlAs/InGaAsSb/InGaAs double heterojunction bipolar transistors

Chien Fong Lo, Chih Yang Chang, S. H. Chen, C. M. Chang, S. Y. Wang, J. I. Chyi, I. I. Kravchenko, S. J. Pearton, F. Ren

研究成果: 書貢獻/報告類型會議論文篇章同行評審

摘要

A trilevel resist system was employed to fabricate self-aligned, submicron emitter finger In0.52Al0.48As/In0.42Ga 0.58As0.77Sb0.23/In0.53Ga 0.47As double heterojunction bipolar transistors (DHBTs). Selective wet-etchants were used to define the emitter fingers and to form an InGaAs guard-ring around the emitter fingers. Due to the low energy bandgap of the InGaAsSb base layer and type II base-collector junction, a low turn-on voltage of 0.38 V at 1 A/cm2and a high dc current gain of 123.8 for a DHBT with a 0.65 x 8.65 μm2 emitter area were obtained. A unity gain cut-off frequency (fT) of 260 GHz and a maximum oscillation frequency (fmax) of 485 GHz at JC = 302 kA/cm2 were achieved.

原文???core.languages.en_GB???
主出版物標題State-of-the-Art Program on Compound Semiconductors 53, SOTAPOCS 53
發行者Electrochemical Society Inc.
頁面117-127
頁數11
版本6
ISBN(電子)9781607682608
ISBN(列印)9781566779067
DOIs
出版狀態已出版 - 2011
事件State-of-the-Art Program on Compound Semiconductors 53, SOTAPOCS 53 - 220th ECS Meeting - Boston, MA, United States
持續時間: 9 10月 201114 10月 2011

出版系列

名字ECS Transactions
號碼6
41
ISSN(列印)1938-5862
ISSN(電子)1938-6737

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???event.eventtypes.event.conference???State-of-the-Art Program on Compound Semiconductors 53, SOTAPOCS 53 - 220th ECS Meeting
國家/地區United States
城市Boston, MA
期間9/10/1114/10/11

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