Er diffusion into gallium nitride

Chii Chang Chen, Yi Sheng Ting, Chien Chieh Lee, Gou Chung Chi, Purushottam Chakraborty, Tapas Chini, Hui Wen Chuang, Jian Shihn Tsang, Cheng Ta Kuo, Wen Chung Tsai, Shu Han Chen, Jen Inn Chyi

研究成果: 雜誌貢獻期刊論文同行評審

3 引文 斯高帕斯(Scopus)

摘要

In this study, we report the diffusion mechanism of Er in GaN and the optical properties of Er-diffused GaN. The diffusion coefficient has been measured by Rutherford backscattering spectroscopy and secondary ion mass spectrometry. Erbium is also implanted into GaN to compare the photoluminescence (PL) characteristics. The PL emission of Er-diffused and implanted GaN can be observed in infrared region. The emission intensity efficiency related to the Er concentration distribution after the Er diffusion is discussed.

原文???core.languages.en_GB???
頁(從 - 到)529-531
頁數3
期刊Solid-State Electronics
47
發行號3
DOIs
出版狀態已出版 - 3月 2003

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