@inproceedings{a32228d1768b4f548e86f7de455ff12f,
title = "Enhancing the optical and electrical properties of SnO2 films by plasma etching deposition",
abstract = "Fluorine-doped tin oxide films have been deposited by plasma etching deposition with Sn target. The extinction coefficient is less than 1.5x10-3 in the range of 400nm to 800nm and the lowest resistitivuty is 1.5×10-3 Ω-cm.",
author = "Liao, {Bo Huei} and Lee, {Cheng Chung} and Kuo, {Chien Cheng} and Chen, {Ping Zen}",
year = "2010",
doi = "10.1364/oic.2010.mc5",
language = "???core.languages.en_GB???",
isbn = "9781557528919",
series = "Optics InfoBase Conference Papers",
publisher = "Optical Society of America (OSA)",
booktitle = "Optical Interference Coatings, OIC 2010",
note = "Optical Interference Coatings, OIC 2010 ; Conference date: 06-06-2010 Through 11-06-2010",
}