Enhanced Electrical Properties of AlInN/AlN/GaN Heterostructure using AlxGa1-xN/AlyGa1-yN superlattice

Yu Chih Chen, Indraneel Sanyal, Jen Inn Chyi

研究成果: 書貢獻/報告類型會議論文篇章同行評審

摘要

In this work, the role of an AlxGa1-xN/AlyGa1-yN superlattice (SL) layer in the buffer layer on the dislocation density and transport property of AlInN/AIN/GaN heterostructures grown on 150 mm silicon (111) substrate is investigated. It is found that the threading dislocation density in the GaN buffer strongly depends on the composition, thickness and the position of the SL layer. Electron mobility of 1,940 cm2/V-s with two dimensional electron gas density of 1.45×1013cm-2, resulting in a sheet resistance of 221 ohm/□, is achieved by using 10 pairs of Al0.2Ga0.8N/Al0.8Ga0.2N SL placed just above the thin AIN nucleation layer on Si substrate.

原文???core.languages.en_GB???
主出版物標題2019 Compound Semiconductor Week, CSW 2019 - Proceedings
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9781728100807
DOIs
出版狀態已出版 - 5月 2019
事件2019 Compound Semiconductor Week, CSW 2019 - Nara, Japan
持續時間: 19 5月 201923 5月 2019

出版系列

名字2019 Compound Semiconductor Week, CSW 2019 - Proceedings

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???event.eventtypes.event.conference???2019 Compound Semiconductor Week, CSW 2019
國家/地區Japan
城市Nara
期間19/05/1923/05/19

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