Enhance transmission through a nano-slit bordered by both trenches and bumps nanostructures

C. M. Wang, C. C. Chao, J. Y. Chang

研究成果: 書貢獻/報告類型會議論文篇章同行評審

摘要

A very large transmission, 20%, of light through a nano metallic slit bordered by both nano trenches and bumps has been demonstrated theoretically. The trenches bordering the nano slit, are used to excite free-space light into surface waves, while the bumps bordering the trenches are used to confine surface wave leakage. Over 50% of the escaping surface waves can be reclaimed by using a pair of bumps with a reflectivity larger than 99%. As a result, the transmission of a trench-surrounded slit bordered by a pair of bumps can be enhanced 1.5 fold.

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主出版物標題Plasmonics
主出版物子標題Nanoimaging, Nanofabrication, and their Applications II
DOIs
出版狀態已出版 - 2006
事件Plasmonics: Nanoimaging, Nanofabrication, and their Applications II - San Diego, CA, United States
持續時間: 16 8月 200617 8月 2006

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
6324
ISSN(列印)0277-786X

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???event.eventtypes.event.conference???Plasmonics: Nanoimaging, Nanofabrication, and their Applications II
國家/地區United States
城市San Diego, CA
期間16/08/0617/08/06

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