Electromigration studies on Sn(Cu) alloy lines

C. C. Lu, S. J. Wang, C. Y. Liu

研究成果: 書貢獻/報告類型會議論文篇章同行評審

摘要

Cu alloying effect in Sn(Cu) solder line has been studied. We found that the Sn0.7Cu solder line has the most serious EM damage than pure Sn and Sn3.0Cu solder lines. The dominant factor for the fast EM rate in Sn0.7Cu could be attributed to the relatively small grain size and the low critical stress, i.e., the yielding stress of Sn0.7Cu solder line. Also, we found that the shortest Sn0.7Cu solder line, 250 μm, has most serious EM damage among three solder lines of different lengths. The back-stress induced by EM might not play a significant role on the EM test of long solder lines. A new failure mode of EM test, i.e., EM under an external tensile, was observed. The external stress would be superimposed on the stress profile induced by EM. As a result, the hillock formation at the anode side was retarded and void formation at the cathode was enhanced.

原文???core.languages.en_GB???
主出版物標題Proceedings - 2005 10th International Symposium on Advanced Packaging Materials
主出版物子標題Processes, Properties and Interfaces
頁面54-59
頁數6
DOIs
出版狀態已出版 - 2005
事件2005 10th International Symposium on Advanced Packaging Materials: Processes, Properties and Interfaces - Irvine, CA, United States
持續時間: 16 3月 200518 3月 2005

出版系列

名字Proceedings of the International Symposium and Exhibition on Advanced Packaging Materials Processes, Properties and Interfaces
2005

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???event.eventtypes.event.conference???2005 10th International Symposium on Advanced Packaging Materials: Processes, Properties and Interfaces
國家/地區United States
城市Irvine, CA
期間16/03/0518/03/05

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