Effects of rf magnetron plasma on the particle size distribution in laser ablation deposition

Tien I. Bao, S. H. Tsai, Lin I

研究成果: 雜誌貢獻期刊論文同行評審

3 引文 斯高帕斯(Scopus)

摘要

The effect of the externally introduced rf magnetron plasma on the particle size distribution on films deposited by pulsed laser ablation is investigated. A cw low energy magnetron rf plasma is sustained between the target and the substrate during the laser ablation deposition process. The ablated droplets can be negatively charged and filtered by the plasma. For Si and Al target ablation, the filtering efficiency of the inert Ar plasma is about 20%, and is independent of the ejected particle size in our system. If oxygen is introduced into the plasma to deposit oxide thin films, the oxidation of the target surface in the reactive plasma changes the size distribution of the ejected particles, and largely reduces the average size of the ejected particles.

原文???core.languages.en_GB???
頁(從 - 到)489-493
頁數5
期刊Journal of Applied Physics
78
發行號1
DOIs
出版狀態已出版 - 1995

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