Effects of microwave power on thermal annealing behaviors of hydrogenated amorphous silicon

Ping Jung Wu, I. Chen Chen, Chien Chieh Lee, Jenq Yang Chang, Tomi T. Li, Chiung Chieh Su

研究成果: 書貢獻/報告類型會議論文篇章同行評審

1 引文 斯高帕斯(Scopus)

摘要

In this study, we have investigated the recrystallization behaviors of hydrogenated amorphous silicon (a-Si:H) films by post-growth thermal annealing as a function of microwave power using electron cyclotron resonance chemical vapor deposition (ECRCVD). The crytallinity of annealed a-Si:H films depends on the porosity of the as-deposited thin films. We suggested that the film with high porosity has lowest crystallinity due to strong oxygen diffusion and formation of SiOx inside the film.

原文???core.languages.en_GB???
主出版物標題Photovoltaics for the 21st Century 6\
發行者Electrochemical Society Inc.
頁面65-69
頁數5
版本17
ISBN(電子)9781566778732
ISBN(列印)9781607682233
DOIs
出版狀態已出版 - 2010
事件Photovoltaics for the 21st Century 6 - 218th ECS Meeting - Las Vegas, NV, United States
持續時間: 10 10月 201015 10月 2010

出版系列

名字ECS Transactions
號碼17
33
ISSN(列印)1938-5862
ISSN(電子)1938-6737

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???event.eventtypes.event.conference???Photovoltaics for the 21st Century 6 - 218th ECS Meeting
國家/地區United States
城市Las Vegas, NV
期間10/10/1015/10/10

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