Effect of surface steps on the diffusion of adsorbates investigated with angle-resolved photoelectron spectroscopy

Dah An Luh, Chi Lu Chen, Xihui Liang, Cheng Maw Cheng, Ku Ding Tsuei

研究成果: 雜誌貢獻期刊論文同行評審

2 引文 斯高帕斯(Scopus)

摘要

To investigate the surface diffusion of chemisorbed H on Ag/Au(111) thin films with surface steps, we characterized the distribution of H atoms on the surface by measuring the Shockley states of these surfaces with angle-resolved photoelectron spectroscopy. Our results show that H atoms tend to diffuse and to remain on the terrace at the lower side of the surface steps during annealing. This diffusive behavior is explained qualitatively through the existence of an Ehrlich-Schwoebel potential barrier associated with the surface steps.

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文章編號045424
期刊Physical Review B - Condensed Matter and Materials Physics
86
發行號4
DOIs
出版狀態已出版 - 16 7月 2012

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