Effect of m-plane GaN substrate miscut on InGaN/GaN quantum well growth

K. Y. Lai, T. Paskova, V. D. Wheeler, J. A. Grenko, M. A.L. Johnson, K. Udwary, E. A. Preble, K. R. Evans

研究成果: 雜誌貢獻期刊論文同行評審

11 引文 斯高帕斯(Scopus)

摘要

The effect of m-plane GaN substrate miscut on the growth of InGaN/GaN quantum wells (QWs) was investigated. It was found that the miscut toward [0 0 0 1] c+-axis resulted in an increase of In incorporation efficiency and in a green-shift of the QW emission, while the miscut toward [1 1 2 0] a-axis resulted in even higher In compositions but it also led to an increased epitaxial surface roughness and deterioration of the QW structures. The results indicated that miscut toward a-axis is undesirable while miscut toward c+-axis is beneficial for achieving longer wavelength emission in QWs grown on m-plane GaN substrates.

原文???core.languages.en_GB???
頁(從 - 到)902-905
頁數4
期刊Journal of Crystal Growth
312
發行號7
DOIs
出版狀態已出版 - 15 3月 2010

指紋

深入研究「Effect of m-plane GaN substrate miscut on InGaN/GaN quantum well growth」主題。共同形成了獨特的指紋。

引用此