Double Nitrogenation Layer Formed Using Nitric Oxide for Enhancing Li+ Storage Performance, Cycling Stability, and Safety of Si Electrodes

Rahmandhika Firdauzha Hary Hernandha, Bharath Umesh, Jagabandhu Patra, Chung Jen Tseng, Chien Te Hsieh, Ju Li, Jeng Kuei Chang

研究成果: 雜誌貢獻期刊論文同行評審

1 引文 斯高帕斯(Scopus)

摘要

To enhance Li storage properties, nitrogenation methods are developed for Si anodes. First, melamine, urea, and nitric oxide (NO) precursors are used to nitrogenize carbon-coated Si particles. The properties of the obtained particles are compared. It is found that the NO process can maximize the graphitic nitrogen (N) content and electronic conductivity of a sample. In addition, optimized N functional groups and O─C species on the electrode surface increase electrolyte wettability. However, with a carbon barrier layer, NO hardly nitrogenizes the Si cores. Therefore, bare Si particles are reacted with NO. Core-shell Si@amorphous SiNx particles are produced using a facile and scalable NO treatment route. The effects of the NO reaction time on the physicochemical properties and charge–discharge performance of the obtained materials are systematically examined. Finally, the Si@SiNx particles are coated with N-doped carbon. Superior capacities of 2435 and 1280 mAh g−1 are achieved at 0.2 and 5 A g−1, respectively. After 300 cycles, 90% of the initial capacity is retained. In addition, differential scanning calorimetry data indicate that the multiple nitrogenation layers formed by NO significantly suppress electrode exothermic reactions during thermal runaway.

原文???core.languages.en_GB???
文章編號2310062
期刊Advanced Science
11
發行號25
DOIs
出版狀態已出版 - 3 7月 2024

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