摘要
The 2-D semiconductors have been recognized as promising channel materials for the ultimately scaled transistor technologies beyond silicon. An essential technology enabler for 2-D semiconductor electronics is the development of dielectric materials interfaced with 2-D semiconductors. In this review article, we overview different types of dielectric materials that are suitable for different application scenarios, including high-k gate dielectrics, low- k spacers, and thermal management materials under the paradigm of 2-D semiconductor electronics. A material selection guideline for dielectric materials and the key process technology modules are discussed in detail. A special emphasis is made on how each of the dielectric technologies may enable the further scaling and practical applications of 2-D semiconductor transistors. The state-of-the-art device technologies are summarized, and the remaining challenges toward practical applications are discussed from the industrial perspective.
原文 | ???core.languages.en_GB??? |
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頁(從 - 到) | 1454-1473 |
頁數 | 20 |
期刊 | IEEE Transactions on Electron Devices |
卷 | 70 |
發行號 | 4 |
DOIs | |
出版狀態 | 已出版 - 1 4月 2023 |