Development of micro-pores including nano-pores on n-Si (100) coated with sparse Ag under dark etching in 1.0 m NH 4F containing 5.0 M H 2O 2

J. C. Lin, C. L. Chuang, C. C. Lin, G. Lerondel

研究成果: 雜誌貢獻期刊論文同行評審

1 引文 斯高帕斯(Scopus)

摘要

Specimens of n-type single crystalline silicon sparsely deposited with silver nano-particles on the Si (100) surfaces were put in 1.0 M NH 4F + 5.0 M H 2O 2 to investigate their dark etching. Through examination by scanning electron microscopy (SEM), the morphology on the n-Si (100) surface etched for 1 h revealed a sparse distribution of nano-pores (10~40 nm in diameter) according to the locations of Ag-particles; however, it exhibited porous surface consisting of micro-pores (1.5~3.1μm in diameter with 15~20μm in depth) where nano-pores (100~150 nm in diameter) were embedded inside for the etching duration prolonged for 5 h. The Nyquist plot for this system indicated two typical semicircles, in which the one in response to high frequencies revealed greater diameter and the other in response to low frequencies indicated smaller diameter. By checking the chemical bonding of silicon and silica in the NH 4F/H 2O 2 system shows two important points at 99.3 eV and 103.4 eV.

原文???core.languages.en_GB???
頁(從 - 到)6846-6858
頁數13
期刊International Journal of Electrochemical Science
7
發行號8
出版狀態已出版 - 8月 2012

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