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Development of a full-field polarization interferometer for measurement of wafer surface profile
Yue Jhe Tsai, Hsing Hsien Tsai,
Ju Yi Lee
, Hung Lin Hsieh
機械工程學系
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深入研究「Development of a full-field polarization interferometer for measurement of wafer surface profile」主題。共同形成了獨特的指紋。
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Keyphrases
Surface Profile
100%
Wafer Surface
100%
Polarization Interferometer
100%
Field Polarization
100%
Interference Pattern
66%
Four-phase
33%
Quality Control
33%
Fast Measurement
33%
Fizeau
33%
Measurement Resolution
33%
Phase Quadrature
33%
Semiconductor Industry
33%
Control Efficacy
33%
Product Performance
33%
Promising Solutions
33%
Existing Techniques
33%
Polarization Interferometry
33%
Polarization Camera
33%
Manufacturing Efficiency
33%
Measurement Speed
33%
Phase-shifting Algorithm
33%
Experimental Testing
33%
Polarization Interference
33%
Surface Profile Measurement
33%
Engineering
Surface Profile
100%
Polarization Field
100%
Interference Pattern
66%
Interferometry
33%
Measurement Resolution
33%
Quality Control
33%
Product Performance
33%
Chemical Engineering
Interferometry
100%