TY - JOUR
T1 - Designs for optimizing depth of focus and spot size for UV laser ablation
AU - Wei, An Chi
AU - Sze, Jyh Rou
AU - Chern, Jyh Long
PY - 2010/11
Y1 - 2010/11
N2 - The proposed optical systems are designed for extending the depths of foci (DOF) of UV lasers, which can be exploited in the laser-ablation technologies, such as laser machining and lithography. The designed systems are commonly constructed by an optical module that has at least one aspherical surface. Two configurations of optical module, lens-only and lens-reflector, are presented with the designs of 2-lens and 1-lens-1-reflector demonstrated by commercially optical software. Compared with conventional DOF-enhanced systems, which required the chromatic aberration lenses and the light sources with multiple wavelengths, the proposed designs are adapted to the single-wavelength systems, leading to more economical and efficient systems.
AB - The proposed optical systems are designed for extending the depths of foci (DOF) of UV lasers, which can be exploited in the laser-ablation technologies, such as laser machining and lithography. The designed systems are commonly constructed by an optical module that has at least one aspherical surface. Two configurations of optical module, lens-only and lens-reflector, are presented with the designs of 2-lens and 1-lens-1-reflector demonstrated by commercially optical software. Compared with conventional DOF-enhanced systems, which required the chromatic aberration lenses and the light sources with multiple wavelengths, the proposed designs are adapted to the single-wavelength systems, leading to more economical and efficient systems.
UR - http://www.scopus.com/inward/record.url?scp=78049346653&partnerID=8YFLogxK
U2 - 10.1007/s00339-010-5834-6
DO - 10.1007/s00339-010-5834-6
M3 - 期刊論文
AN - SCOPUS:78049346653
SN - 0947-8396
VL - 101
SP - 411
EP - 416
JO - Applied Physics A: Materials Science and Processing
JF - Applied Physics A: Materials Science and Processing
IS - 2
ER -