Designs for optimizing depth of focus and spot size for UV laser ablation

An Chi Wei, Jyh Rou Sze, Jyh Long Chern

研究成果: 雜誌貢獻期刊論文同行評審

摘要

The proposed optical systems are designed for extending the depths of foci (DOF) of UV lasers, which can be exploited in the laser-ablation technologies, such as laser machining and lithography. The designed systems are commonly constructed by an optical module that has at least one aspherical surface. Two configurations of optical module, lens-only and lens-reflector, are presented with the designs of 2-lens and 1-lens-1-reflector demonstrated by commercially optical software. Compared with conventional DOF-enhanced systems, which required the chromatic aberration lenses and the light sources with multiple wavelengths, the proposed designs are adapted to the single-wavelength systems, leading to more economical and efficient systems.

原文???core.languages.en_GB???
頁(從 - 到)411-416
頁數6
期刊Applied Physics A: Materials Science and Processing
101
發行號2
DOIs
出版狀態已出版 - 11月 2010

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