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Degradation of sulfamethazine by cerium mediated photoelectrochemical oxidation with hydroxyl radical oxidation effect
Yi Hung Liu
, Xiao Qi Peng
, Wei Lung Chou
化學工程與材料工程學系
研究成果
:
雜誌貢獻
›
期刊論文
›
同行評審
12
引文 斯高帕斯（Scopus）
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深入研究「Degradation of sulfamethazine by cerium mediated photoelectrochemical oxidation with hydroxyl radical oxidation effect」主題。共同形成了獨特的指紋。
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Keyphrases
Cerium
100%
Sulfamethazine
100%
Oxidation Effect
100%
Hydroxyl Radical Oxidation
100%
Photoelectrochemical Oxidation
100%
Cerium(IV)
83%
Hydrogen Peroxide
50%
Mediated Electrochemical Oxidation
50%
Oxidation System
50%
Removal Efficiency
33%
Sulfamethazine Degradation
33%
Cerium Ions
33%
Sulfamethazine Removal
33%
UV Radiation
16%
Hydroxyl Radical
16%
Nitric Acid
16%
Reaction Temperature
16%
Environmental Matrices
16%
System Integration
16%
High Production
16%
Time-to-treatment
16%
Good Reversibility
16%
Redox Reaction
16%
Maximum Current Density
16%
3,4-dihydroxybenzoic Acid
16%
Electrolytic Production
16%
Pseudo-first-order Model
16%
Emerging Contaminants
16%
Specific Energy Consumption
16%
4-hydroxybenzoic Acid
16%
Pseudo-second-order Model
16%
UV Photocatalysis
16%
UV-H2O2
16%
OH Oxidation
16%
Chemistry
Hydroxyl Radical
100%
Cerium
100%
Sulfamethazine
100%
Hydrogen Peroxide
44%
Electrochemical Oxidation
33%
Current Density
11%
Rate Constant
11%
Redox Reactions
11%
Ultraviolet Irradiation
11%
Energy Consumption
11%
4-Hydroxybenzoic Acid
11%
Photocatalysis
11%
3,4-dihydroxybenzoic Acid
11%
Chemical Engineering
Hydrogen Peroxide
100%
Oxidation System
75%
Photocatalysis
25%
Emerging Contaminant
25%
Pseudo-second-order Model
25%
Material Science
Cerium
100%
Hydrogen Peroxide
44%
Anode
11%
Density
11%
Redox Process
11%
Photocatalysis
11%