Controlling the feature size made by two-photon photopolymerization in a threshold material

Ting Wei Chang; Hong Yao Mong; Jiunn Yuan Lin; Jyhpyng Wang; Chau Hwang Lee

Controlling the feature size made by two-photon photopolymerization in a threshold material

Ting Wei Chang, Hong Yao Mong, Jiunn Yuan Lin, Jyhpyng Wang, Chau Hwang Lee

物理學系

研究成果: 雜誌貢獻 › 會議論文 › 同行評審

摘要

The feature size made by two-photon photopolymerization is described by a threshold model. In a negative photoresist SU-8 we show the linewidth fabricated by this nonlinear process is consistent with the prediction of this model.

原文	???core.languages.en_GB???
頁（從 - 到）	593-594
頁數	2
期刊	OSA Trends in Optics and Photonics Series
卷	88
出版狀態	已出版 - 2003
事件	Conference on Lasers and Electro-Optics (CLEO); Postconference Digest - Baltimore, MD, United States 持續時間: 1 6月 2003 → 6 6月 2003

引用此

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abstract = "The feature size made by two-photon photopolymerization is described by a threshold model. In a negative photoresist SU-8 we show the linewidth fabricated by this nonlinear process is consistent with the prediction of this model.",

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AU - Mong, Hong Yao

AU - Lin, Jiunn Yuan

AU - Wang, Jyhpyng

AU - Lee, Chau Hwang

PY - 2003

Y1 - 2003

N2 - The feature size made by two-photon photopolymerization is described by a threshold model. In a negative photoresist SU-8 we show the linewidth fabricated by this nonlinear process is consistent with the prediction of this model.

AB - The feature size made by two-photon photopolymerization is described by a threshold model. In a negative photoresist SU-8 we show the linewidth fabricated by this nonlinear process is consistent with the prediction of this model.

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M3 - 會議論文

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SN - 1094-5695

VL - 88

SP - 593

EP - 594

JO - OSA Trends in Optics and Photonics Series

JF - OSA Trends in Optics and Photonics Series

T2 - Conference on Lasers and Electro-Optics (CLEO); Postconference Digest

Y2 - 1 June 2003 through 6 June 2003

ER -

Controlling the feature size made by two-photon photopolymerization in a threshold material

摘要

指紋

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