@inproceedings{a1dea8bff5e64d1b9fef1a96ef49d813,
title = "Controllable fabrication of nanogap structure based on nanosphere lithography",
abstract = "One method was developed for fabricating nanogap structures, which combined the nanosphere lithography, reaction ion etching and glancing deposition technologies. The results show that 10 nm-200 nm nanogaps structure could be prepared by changing the deposition angle, and nanogap structure patterns could be changed with different incident orientation.",
keywords = "Fabrication, Nanogap Structure, Nanosphere Lithography",
author = "Daxiao Zhang and Dongjie Hu and Yongliang Zhou and Shaoliang Cheng",
year = "2012",
doi = "10.4028/www.scientific.net/AMR.486.90",
language = "???core.languages.en_GB???",
isbn = "9783037853863",
series = "Advanced Materials Research",
pages = "90--94",
booktitle = "Nanotechnology and Advanced Materials",
note = "2012 International Conference on Nanotechnology Technology and Advanced Materials, ICNTAM 2012 ; Conference date: 12-04-2012 Through 13-04-2012",
}