Coating uniformity improvement for a dense-wavelength-division-multiplexing filter by use of the etching effect

Jin Cherng Hsu; Cheng Chung Lee; Chien Chung Kuo; Sheng Hui Chen; Jean Yee Wu; Huang Lu Chen; Ching Yi Wei

doi:10.1364/AO.44.004402

Coating uniformity improvement for a dense-wavelength-division-multiplexing filter by use of the etching effect

Jin Cherng Hsu, Cheng Chung Lee, Chien Chung Kuo, Sheng Hui Chen, Jean Yee Wu, Huang Lu Chen, Ching Yi Wei

光電科學與工程學系

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

11 引文斯高帕斯（Scopus）

摘要

The uniformity of optical narrow-bandpass filters for dense wavelength division multiplexing (DWDM) has been improved by control of the coating parameters of electron guns and the ion source. The optical film was deposited by the electron gun and was etched by the ion source during the ion-assisted deposition process. The uniformity of the coating of a 100 GHz DWDM filter is better than ±0.003% over a circular area of 50 mm in diameter when such an etching process is used.

原文	???core.languages.en_GB???
頁（從 - 到）	4402-4407
頁數	6
期刊	Applied Optics
卷	44
發行號	20
DOIs	https://doi.org/10.1364/AO.44.004402
出版狀態	已出版 - 10 7月 2005

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10.1364/AO.44.004402

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AU - Hsu, Jin Cherng

AU - Lee, Cheng Chung

AU - Kuo, Chien Chung

AU - Chen, Sheng Hui

AU - Wu, Jean Yee

AU - Chen, Huang Lu

AU - Wei, Ching Yi

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AB - The uniformity of optical narrow-bandpass filters for dense wavelength division multiplexing (DWDM) has been improved by control of the coating parameters of electron guns and the ion source. The optical film was deposited by the electron gun and was etched by the ion source during the ion-assisted deposition process. The uniformity of the coating of a 100 GHz DWDM filter is better than ±0.003% over a circular area of 50 mm in diameter when such an etching process is used.

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JF - Applied Optics

IS - 20

ER -

Coating uniformity improvement for a dense-wavelength-division-multiplexing filter by use of the etching effect

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