@inproceedings{8615d5aa85e14be99e6c0dfd9f191094,
title = "Characterization of silicon oxynitride films deposited by HIPIMS deposition technique",
abstract = "In this research, silicon oxynitride films were prepared by high-power impulse magnetron sputtering. The transmittance of SiON films increased from 13.6% to 88.9% at 215 nm after introducing 2.2 sccm O2 gas. The extinction coefficient was smaller than 1×10-3 from 250nm to 700nm. The average transmittance of the SiON films on the glass in the visible range was 86 % and its hardness was 24 Gpa as introducing 2 sccm O2 gas.",
author = "Liao, {Bo Huei} and Hsiao, {Chien Nan} and Shiao, {Ming Hua} and Chan, {Shih Hao} and Chen, {Sheng Hui} and Weng, {Sheng De}",
note = "Publisher Copyright: {\textcopyright} OSA 2019 {\textcopyright} 2019 The Author(s); Optical Interference Coatings, OIC 2019 ; Conference date: 02-06-2019 Through 07-06-2019",
year = "2019",
doi = "10.1364/OIC.2019.WB.2",
language = "???core.languages.en_GB???",
isbn = "9781943580583",
series = "Optics InfoBase Conference Papers",
publisher = "Optica Publishing Group (formerly OSA)",
booktitle = "Optical Interference Coatings, OIC 2019",
}