Boron-induced strain relaxation in hydrogen-implanted SiGe/Si heterostructures

Sheng Wei Lee, Chi An Chueh, Hung Tai Chang

研究成果: 雜誌貢獻期刊論文同行評審

2 引文 斯高帕斯(Scopus)

指紋

深入研究「Boron-induced strain relaxation in hydrogen-implanted SiGe/Si heterostructures」主題。共同形成了獨特的指紋。

Keyphrases

Material Science