Automatic iris mask refinement for high performance iris recognition

Yung Hui Li, Marios Savvides

研究成果: 書貢獻/報告類型會議論文篇章同行評審

2 引文 斯高帕斯(Scopus)

摘要

How to estimate artifacts on an iris image in polar domain is an important question for any iris recognition system which pursues high recognition rate as its goal. In literature, there are many different existing algorithm that estimate iris occlusion in either Cartesian or polar coordinate. In this paper, our goal is not to propose another new method to compete with existing method. Rather, our goal is to propose a new algorithm which can take any iris mask estimated by existing algorithm, and refine it into a much more accurate mask. In this way, our proposed method could co-work with any other existing algorithm and improve iris recognition performance. Experimental results show our proposed method can improve iris recognition rate by a great lead compared to the performance of the system using the unrefined iris masks.

原文???core.languages.en_GB???
主出版物標題2009 IEEE Workshop on Computational Intelligence in Biometrics
主出版物子標題Theory, Algorithms, and Applications, CIB 2009 - Proceedings
頁面52-58
頁數7
DOIs
出版狀態已出版 - 2009
事件2009 IEEE Workshop on Computational Intelligence in Biometrics: Theory, Algorithms, and Applications, CIB 2009 - Nashville, TN, United States
持續時間: 30 3月 20092 4月 2009

出版系列

名字2009 IEEE Workshop on Computational Intelligence in Biometrics: Theory, Algorithms, and Applications, CIB 2009 - Proceedings

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???event.eventtypes.event.conference???2009 IEEE Workshop on Computational Intelligence in Biometrics: Theory, Algorithms, and Applications, CIB 2009
國家/地區United States
城市Nashville, TN
期間30/03/092/04/09

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