An iterative subaperture position correction algorithm

Weng Hou Lo, Po Chih Lin, Yi Chun Chen

研究成果: 書貢獻/報告類型會議論文篇章同行評審

摘要

The subaperture stitching interferometry is a technique suitable for testing high numerical-aperture optics, large-diameter spherical lenses and aspheric optics. In the stitching process, each subaperture has to be placed at its correct position in a global coordinate, and the positioning precision would affect the accuracy of stitching result. However, the mechanical limitations in the alignment process as well as vibrations during the measurement would induce inevitable subaperture position uncertainties. In our previous study, a rotational scanning subaperture stitching interferometer has been constructed. This paper provides an iterative algorithm to correct the subaperture position without altering the interferometer configuration. Each subaperture is first placed at its geometric position estimated according to the F number of reference lens, the measurement zenithal angle and the number of pixels along the width of subaperture. By using the concept of differentiation, a shift compensator along the radial direction of the global coordinate is added into the stitching algorithm. The algorithm includes two kinds of compensators: one for the geometric null with four compensators of piston, two directional tilts and defocus, and the other for the position correction with the shift compensator. These compensators are computed iteratively to minimize the phase differences in the overlapped regions of subapertures in a least-squares sense. The simulation results demonstrate that the proposed method works to the position accuracy of 0.001 pixels for both the single-ring and multiple-ring configurations. Experimental verifications with the single-ring and multiple-ring data also show the effectiveness of the algorithm.

原文???core.languages.en_GB???
主出版物標題Optical Manufacturing and Testing XI
編輯Ray Williamson, Oliver W. Fahnle, Dae Wook Kim
發行者SPIE
ISBN(電子)9781628417418
DOIs
出版狀態已出版 - 2015
事件Optical Manufacturing and Testing XI - San Diego, United States
持續時間: 9 8月 201511 8月 2015

出版系列

名字Proceedings of SPIE - The International Society for Optical Engineering
9575
ISSN(列印)0277-786X
ISSN(電子)1996-756X

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???event.eventtypes.event.conference???Optical Manufacturing and Testing XI
國家/地區United States
城市San Diego
期間9/08/1511/08/15

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