Aliphatic dithiocarboxylic acids: New adsorbates for soft lithographic patterning

Tai Chou Lee, Pei Chun Chen, Ting Ying Lai, Wirote Tuntiwechapikul, Jun Hyun Kim, T. Randall Lee

研究成果: 雜誌貢獻期刊論文同行評審

11 引文 斯高帕斯(Scopus)

摘要

This paper describes an initial evaluation of the use of aliphatic dithiocarboxylic acids (ADTCAs) as transient protecting agents in soft lithographic patterning, also known as microcontact printing (μCP). Surfaces micropatterned using ADTCA-based inks (C10-C16) were compared to that patterned using a standard hexadecanethiol ink. The patterns were characterized by scanning electron microscopy (SEM) and atomic force microscopy (AFM). Etch-removal studies of SAM-coated gold substrates found that the longer chain-length ADTCAs (C13-C16) provide better protection against etching than the shorter chain-length ADTCAs (C10-C12). These studies demonstrate that ADTCA-derived SAMs can be used as effective resists for soft lithographic applications.

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頁(從 - 到)7064-7068
頁數5
期刊Applied Surface Science
254
發行號21
DOIs
出版狀態已出版 - 30 8月 2008

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