AlInGaN/GaN HEMTs with High Johnson's Figure-of-Merit on Low Resistivity Silicon Substrate

Indraneel Sanyal, En Shuo Lin, Yu Chen Wan, Kun Ming Chen, Po Tsung Tu, Po Chun Yeh, Jen Inn Chyi

研究成果: 雜誌貢獻期刊論文同行評審

3 引文 斯高帕斯(Scopus)


This work demonstrates high-performance AlInGaN/AlN/GaN high electron mobility transistors grown on 150 mm p-type low resistivity (resistivity 20-100 Omega -cm) silicon substrate with state-of-the-art Johnson's figure-of-merit (JFOM). Current gain cut-off frequency ( text{f}-{mathrm{ T}} ) of 83 GHz and 63 GHz and power gain cut-off frequency ( text{f}-{mathrm{ max}} ) of 95 GHz and 77 GHz with a three-terminal off-state breakdown voltage of 69 V and 127 V, resulting in a high JFOM of 5.7 THz-V and 8.1 THz-V are achieved on the devices with a gate length of 0.16 mu text{m} and gate to drain distance of 2 mu text{m} and 4 mu text{m} , respectively. The text{f}-{mathrm{ T}} and J-FOM are comparable or better than the reported values obtained on high resistivity silicon and SiC substrates for devices with similar gate length. On the other hand, GaN-on-Si HEMT structure on the LR-Si substrate exhibits lower power gain and power added efficiency due to strong capacitive coupling effects. TCAD large signal output power simulation indicates significant improvements in output power by minimizing the defects and free charge carriers in the GaN buffer even in the presence of the parasitic channel conduction and conductive silicon substrate. We further propose a modified equivalent circuit model of the parasitic conduction to take into account the conductivity of the GaN and AlGaN buffer.

頁(從 - 到)130-136
期刊IEEE Journal of the Electron Devices Society
出版狀態已出版 - 2021


深入研究「AlInGaN/GaN HEMTs with High Johnson's Figure-of-Merit on Low Resistivity Silicon Substrate」主題。共同形成了獨特的指紋。