AlGaN/GaN high electron mobility transistors with a p-GaN backgate structure

W. T. Lin, W. C. Lin, Y. N. Zhong, Y. M. Hsin

研究成果: 書貢獻/報告類型會議論文篇章同行評審

3 引文 斯高帕斯(Scopus)

摘要

This study discusses the impact of a p-GaN backgate structure on the DC characteristics of AlGaN/GaN HEMTs. AlGaN/GaN HEMTs with a p-GaN backgate layer showed reduction of leakage current and positive shift of threshold voltage while applying negative backgate bias. The shift of threshold voltage was 0.55 V, and reduction of off-state leakage current was 73.1% while backagte bias was -14 V. The on/off current ratio was in the range of 10 with backgate bias. It is possible to operate an AlGaN/GaN HEMT in both D- and E-modes with suitable epitaxial layer design using a p-GaN backagte structure.

原文???core.languages.en_GB???
主出版物標題ECS Transactions
編輯J. Hite, V. Chakrapani, J. Zavada, T. J. Anderson, S. Kilgore
發行者Electrochemical Society Inc.
頁面49-52
頁數4
版本7
ISBN(電子)9781607688358
ISBN(列印)9781607688358
DOIs
出版狀態已出版 - 2018
事件Symposium on Wide Bandgap Semiconductor Materials and Devices 19 - 233rd ECS Meeting - Seattle, United States
持續時間: 13 5月 201817 5月 2018

出版系列

名字ECS Transactions
號碼7
85
ISSN(列印)1938-6737
ISSN(電子)1938-5862

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???event.eventtypes.event.conference???Symposium on Wide Bandgap Semiconductor Materials and Devices 19 - 233rd ECS Meeting
國家/地區United States
城市Seattle
期間13/05/1817/05/18

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