Air-core hollow optical waveguides with omnidirectional reflectors

Shih Shou Lo; Chii Chang Chen

doi:10.1117/1.2189289

Air-core hollow optical waveguides with omnidirectional reflectors

Shih Shou Lo, Chii Chang Chen

光電科學與工程學系

研究成果: 雜誌貢獻 › 期刊論文 › 同行評審

2 引文斯高帕斯（Scopus）

摘要

We have designed and fabricated a hollow optical waveguide with omnidirectional reflectors (ODRs) on a0 silicon substrate. The pattern is defined by photolithography on a (100) silicon wafer. The groove is etched by inductive coupled plasma. Plasma-enhanced chemical vapor deposition technology is used to deposit six-pair Si/SiO₂ (0.111/0.258 μm) multilayer stacks on the sample. Finally, the top of the sample is covered with an identical ODR. Hence, the light is confined in a hollow waveguide.

原文	???core.languages.en_GB???
文章編號	044601
期刊	Optical Engineering
卷	45
發行號	4
DOIs	https://doi.org/10.1117/1.2189289
出版狀態	已出版 - 4月 2006

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10.1117/1.2189289

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@article{0a4fa41d28a04013bd2cc8cc6fee4857,

title = "Air-core hollow optical waveguides with omnidirectional reflectors",

abstract = "We have designed and fabricated a hollow optical waveguide with omnidirectional reflectors (ODRs) on a0 silicon substrate. The pattern is defined by photolithography on a (100) silicon wafer. The groove is etched by inductive coupled plasma. Plasma-enhanced chemical vapor deposition technology is used to deposit six-pair Si/SiO2 (0.111/0.258 μm) multilayer stacks on the sample. Finally, the top of the sample is covered with an identical ODR. Hence, the light is confined in a hollow waveguide.",

keywords = "Hollow waveguide, Omnidirectional reflector",

author = "Lo, {Shih Shou} and Chen, {Chii Chang}",

year = "2006",

month = apr,

doi = "10.1117/1.2189289",

language = "???core.languages.en_GB???",

volume = "45",

journal = "Optical Engineering",

issn = "0091-3286",

number = "4",

}

TY - JOUR

T1 - Air-core hollow optical waveguides with omnidirectional reflectors

AU - Lo, Shih Shou

AU - Chen, Chii Chang

PY - 2006/4

Y1 - 2006/4

N2 - We have designed and fabricated a hollow optical waveguide with omnidirectional reflectors (ODRs) on a0 silicon substrate. The pattern is defined by photolithography on a (100) silicon wafer. The groove is etched by inductive coupled plasma. Plasma-enhanced chemical vapor deposition technology is used to deposit six-pair Si/SiO2 (0.111/0.258 μm) multilayer stacks on the sample. Finally, the top of the sample is covered with an identical ODR. Hence, the light is confined in a hollow waveguide.

AB - We have designed and fabricated a hollow optical waveguide with omnidirectional reflectors (ODRs) on a0 silicon substrate. The pattern is defined by photolithography on a (100) silicon wafer. The groove is etched by inductive coupled plasma. Plasma-enhanced chemical vapor deposition technology is used to deposit six-pair Si/SiO2 (0.111/0.258 μm) multilayer stacks on the sample. Finally, the top of the sample is covered with an identical ODR. Hence, the light is confined in a hollow waveguide.

KW - Hollow waveguide

KW - Omnidirectional reflector

UR - http://www.scopus.com/inward/record.url?scp=33748585176&partnerID=8YFLogxK

U2 - 10.1117/1.2189289

DO - 10.1117/1.2189289

M3 - 期刊論文

AN - SCOPUS:33748585176

SN - 0091-3286

VL - 45

JO - Optical Engineering

JF - Optical Engineering

IS - 4

M1 - 044601

ER -

Air-core hollow optical waveguides with omnidirectional reflectors

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