摘要
To explore the possibility of employing thermally generated H atoms to determine the chemical composition of a metallic surface, we investigated the adsorption and desorption of H atoms generated with a thermal cracker on surfaces Au(111) and Ag/Au(111). Angle-resolved photoemission spectra showed that the noble-metallic surfaces deteriorated upon exposure to a flux of H atoms at ~ 100 K. Upon subsequent annealing, the order of the surfaces was mostly recovered when H atoms on the surfaces desorbed, but the recovery was incomplete even with annealing at a temperature much higher than that at which H atoms desorb. X-ray photoemission spectra showed that O-containing contaminants existed on the surfaces after the H dosing. The evolution of O 1s during annealing indicated that the O-containing contaminants were H2O and its moieties generated during thermal cracking; the disturbances of the surfaces remaining above the desorption temperature of H atoms were likely caused by chemisorbed O. Our results show that it is possible to employ thermally generated H atoms to determine the chemical composition of a metallic surface, but a small proportion of H2O in a H2 gas line might be unavoidable; precautions against possible O contamination are required when a thermal cracker is employed.
原文 | ???core.languages.en_GB??? |
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頁(從 - 到) | 11-18 |
頁數 | 8 |
期刊 | Surface Science |
卷 | 635 |
DOIs | |
出版狀態 | 已出版 - 5月 2015 |