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Abnormal electrical behavior and phase changes in implanted p
+
- And n
+
-Si channels under high current densities
J. S. Huang, C. N. Liao, K. N. Tu,
S. L. Cheng
, L. J. Chen
化學工程與材料工程學系
研究成果
:
雜誌貢獻
›
期刊論文
›
同行評審
10
引文 斯高帕斯(Scopus)
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指紋
指紋
深入研究「Abnormal electrical behavior and phase changes in implanted p
+
- And n
+
-Si channels under high current densities」主題。共同形成了獨特的指紋。
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Keyphrases
Phase Change
100%
Behavior Change
100%
Electrical Behavior
100%
N-Si
100%
Si Channel
100%
High Current Density
100%
Annealing
16%
Scanning Electron Microscopy
16%
Transmission Electron Microscopy
16%
Current Density
16%
Si Substrate
16%
Line Formation
16%
Silicide
16%
Electron Transmission
16%
Resistance Drop
16%
NiSi2
16%
Joule Heating
16%
Electrical Current
16%
Resistance to Change
16%
Electron Gun
16%
Nickel Contacts
16%
Junction Leakage
16%
Channel Resistance
16%
High Field Effects
16%
Field Junction
16%
Material Science
Anode
100%
Density
100%
Cathode
100%
Annealing
50%
Scanning Electron Microscopy
50%
Transmission Electron Microscopy
50%
Silicide
50%
Engineering
High Current Density
100%
Anodes and Cathode
100%
Bridging
50%
Si Substrate
50%
Resistance Change
50%
Channel Resistance
50%
Resistance Heating
50%
Chemical Engineering
Silicide
100%
Joule Heating
100%