A Self-align Gate-last Resistive Gate Switching FinFET Nonvolatile Memory Feasible for Embedded Applications

W. Y. Yang, E. R. Hsieh, C. H. Cheng, Steve S. Chung

研究成果: 書貢獻/報告類型會議論文篇章同行評審

2 引文 斯高帕斯(Scopus)

指紋

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Engineering & Materials Science

Chemical Compounds