A patterned dielectric support process for high performance passive fabrication

C. C. Chen, Ssu Ying Chen, Y. T. Cheng

研究成果: 雜誌貢獻期刊論文同行評審

2 引文 斯高帕斯(Scopus)

摘要

This letter presents a micromachining process to effectively reduce substrate loss via a structure of patterned oxide/nitride fins on a silicon substrate with a resistivity of 1 Ω-cm. Experimental results demonstrate that the insertion loss of a coplanar waveguide (CPW) deposited on the structure can be lowered to the value of 4.33 dB/cm at 40 GHz. Meanwhile, an analytical model is developed to predict the characteristics of the CPW.

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頁(從 - 到)82-84
頁數3
期刊IEEE Microwave and Wireless Components Letters
18
發行號2
DOIs
出版狀態已出版 - 2月 2008

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