A Novel Approach to Localize the Channel Temperature Induced by the Self-heating Effect in 14nm High-k Metal-gate FinFET

E. R. Hsieh, M. J. Jiang, H. W. Chen, J. L. Lin, Steve S. Chung, T. P. Chen, Y. H. Yeah, T. J. Chen, Osbert Cheng

研究成果: 書貢獻/報告類型 › 會議論文篇章 › 同行評審

1 引文 斯高帕斯（Scopus）

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Engineering & Materials Science

Chemical Compounds