A new and simple experimental approach to characterizing the carrier transport and reliability of strained CMOS devices in the quasi-ballistic regime

E. R. Hsieh, Steve S. Chung, P. W. Liu, W. T. Chiang, C. H. Tsai, W. Y. Teng, C. I. Li, T. F. Kuo, Y. R. Wang, C. L. Yang, C. T. Tsai, G. H. Ma

研究成果: 書貢獻/報告類型會議論文篇章同行評審

1 引文 斯高帕斯(Scopus)

摘要

A new yet simple approach, VD,sat method, without complicate temperature measurement setup, has been developed to investigate the carrier transport characteristics for MOSFET devices in the quasi-ballistic regime. It has shown quite good matches with that of Temperature Dependent Method (TDM) developed from the quantum theory [1]. For the first time, the carrier transport properties after HC stress were also examined based on the proposed method. Moreover, VD,sat method has been applied to examine the carrier transport and reliabilities in advanced strain-CMOS devices. In terms of the device performance, the enhancement of the drain current is strongly related to the transport parameter, the injection velocity, Vinj, which serves as a good monitor for the strain design and current enhancement. While, considering the device reliability after the HC stress, ballistic efficiency, Bsat is responsible for the ID degradation as a result of the increase in interface scatterings. Finally, a roadmap of the Vinj from those reported results has been provided which serves as a good reference for designing high performance strain- based CMOS devices.

原文???core.languages.en_GB???
主出版物標題2009 International Electron Devices Meeting, IEDM 2009 - Technical Digest
頁面32.6.1-32.6.4
DOIs
出版狀態已出版 - 2009
事件2009 International Electron Devices Meeting, IEDM 2009 - Baltimore, MD, United States
持續時間: 7 12月 20099 12月 2009

出版系列

名字Technical Digest - International Electron Devices Meeting, IEDM
ISSN(列印)0163-1918

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???event.eventtypes.event.conference???2009 International Electron Devices Meeting, IEDM 2009
國家/地區United States
城市Baltimore, MD
期間7/12/099/12/09

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