A New 1C1T1R nv-TCAM with Simultaneously Hybrid Ferroelectricity and Memristor Layers Feasible for Ultra-highly-dense and High-performance In-memory-searching

Y. L. Hsueh, R. Q. Lin, Y. X. Huang, Y. H. Lin, K. H. Chang, T. H. Shen, E. R. Hsieh, S. Simon Wong

研究成果: 書貢獻/報告類型會議論文篇章同行評審

摘要

We introduce a non-volatile ternary content-addressable memory (nv-TCAM), composed of 1 metal-ferroelectricmetal (MFM (1C)), 1 control-transistor (1T), and 1 metalinsulator-metal (MIM (1R)). The MFM gating a transistor provides the functionality of the 'Care' or 'Don't-care'; meanwhile, the MIM in connection of the drain of the transistor stores a datum to be searched. Results show that the MFM can be cycled 1010 times, and the MIM is up to 106 times. Moreover, a datum can be kept in the MFM and MIM at 91 ° C and 129 °C for predicted 10-year lifetime, respectively. The readout window for the searching bit-'1' / '0' is 0.66 V and 0.8 V, respectively. The searching time is 9 ns with an averaged 22.8 μW of power.

原文???core.languages.en_GB???
主出版物標題IEEE Electron Devices Technology and Manufacturing Conference
主出版物子標題Strengthening the Globalization in Semiconductors, EDTM 2024
發行者Institute of Electrical and Electronics Engineers Inc.
ISBN(電子)9798350371529
DOIs
出版狀態已出版 - 2024
事件8th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2024 - Bangalore, India
持續時間: 3 3月 20246 3月 2024

出版系列

名字IEEE Electron Devices Technology and Manufacturing Conference: Strengthening the Globalization in Semiconductors, EDTM 2024

???event.eventtypes.event.conference???

???event.eventtypes.event.conference???8th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2024
國家/地區India
城市Bangalore
期間3/03/246/03/24

指紋

深入研究「A New 1C1T1R nv-TCAM with Simultaneously Hybrid Ferroelectricity and Memristor Layers Feasible for Ultra-highly-dense and High-performance In-memory-searching」主題。共同形成了獨特的指紋。

引用此