A Ka-Band Low-EVM Subharmonically Injection-Locked FLL IQ Modulator Using Stacked-Boosting and Dual-Injection Technique

Hong Yeh Chang, Wei Cheng Chen, Tien Yi Lin

研究成果: 雜誌貢獻期刊論文同行評審

3 引文 斯高帕斯(Scopus)

摘要

In this letter, a Ka-band low error-vector-magnitude (EVM) subharmonically injection-locked frequency-locked loop (SILFLL) in-phase and quadrature (IQ) modulator is proposed using 0.18-µm CMOS process. The proposed circuit consists of an SILFLL and four reflection-type modulators. A stacked-boosting technique is employed in the oscillation core to further extend the frequency up to 28 GHz, and a dual-injection technique is employed in the SILFLL to significantly widen the lock range. As the subharmonic number is 3, the measured phase noise at 1-MHz offset and jitter integrated from 1 kHz to 40 MHz are better than −120 dBc/Hz and 95 fs, respectively. Between 26.6 and 28.2 GHz, the proposed SILFLL IQ modulator features an EVM of within 8%, a phase error of 2, and a magnitude error of 2% for various quadrature amplitude modulations (QAMs), and the modulation can be up to 64-QAM scheme. The work is suitable for a few advanced digital communications due to its high modulation quality.

原文???core.languages.en_GB???
頁(從 - 到)287-290
頁數4
期刊IEEE Microwave and Wireless Technology Letters
33
發行號3
DOIs
出版狀態已出版 - 1 3月 2023

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