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Very high deposition rate of a-Si:H thin films by ECRCVD

  • H. F. Chiu
  • , Y. S. Chang
  • , J. Y. Wu
  • , Y. S. Li
  • , J. Y. Chang
  • , C. C. Lee
  • , I. C. Chen
  • , C. C. Su
  • , Tomi T. Li

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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Material Science