Very high deposition rate of a-Si:H thin films by ECRCVD

H. F. Chiu, Y. S. Chang, J. Y. Wu, Y. S. Li, J. Y. Chang, C. C. Lee, I. C. Chen, C. C. Su, Tomi T. Li

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

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Engineering & Materials Science