Abstract
This paper proposes the use of nitrogen ion implantation to form circular and donut-shaped channels in vertical GaN Schottky barrier diodes (SBDs). Nitrogen ions with a dose of 1 × 1015 cm−2 and energy of 100/150 keV were used to form a current blocking layer to separate the channel from the mesa edge, thus reducing the etching damage-induced leakage in the reverse bias. SBDs with circular and donut-shaped channels exhibited reduced leakage current, and hence, increased breakdown voltage. In addition, the SBD with a donut-shaped channel exhibited improved specific on-resistance (RON) because it had a wider current spread than did the SBD with a circular channel. Moreover, a floating metal ring (FMR) was added to the SBD with a donut-shaped channel to improve the forward- and reverse-bias characteristics.
Original language | English |
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Pages (from-to) | 5453-5461 |
Number of pages | 9 |
Journal | Journal of Electronic Materials |
Volume | 50 |
Issue number | 9 |
DOIs | |
State | Published - Sep 2021 |
Keywords
- GaN
- SBD
- Schottky barrier diode
- current blocking layer
- floating metal ring