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Varying stress of SiO
x
C
y
thin films deposited by plasma polymerization
Wei Bo Liao
, Ya Chen Chang
, Cheng Chung Jaing
, Ching Long Cheng
, Cheng Chung Lee
, Hung Sen Wei
,
Chien Cheng Kuo
Department of Optics and Photonics
Research output
:
Contribution to journal
›
Article
›
peer-review
3
Scopus citations
Overview
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x
C
y
thin films deposited by plasma polymerization'. Together they form a unique fingerprint.
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Keyphrases
SiOx
100%
Plasma Polymerization
100%
Varying Stress
100%
TiO2-SiO2
28%
Hexamethyldisiloxane (HMDSO)
28%
Cage Structure
28%
Beam Current
28%
Structure Ratio
28%
Plasma Polymer Films
28%
Refractive Index
14%
Absorption Coefficient
14%
Optical Performance
14%
Optical Thin Film
14%
Anode Voltage
14%
Composite Parameters
14%
Engineering
Thin Films
100%
Plasma Polymerization
100%
Flow Rate
33%
Plasma Polymer Film
33%
Flow Velocity
33%
Refractive Index
16%
Tensiles
16%
Optical Performance
16%
Anode Voltage
16%
Silicon Dioxide
16%
Refractivity
16%
Absorptivity
16%
Absorption Coefficient
16%
Material Science
Thin Films
100%
Plasma Polymerization
100%
Titanium Dioxide
33%
Polymer Films
33%
Anode
16%
Refractive Index
16%
Film
16%
Composite Material
16%