Varying stress of SiOxCy thin films deposited by plasma polymerization

Wei Bo Liao; Ya Chen Chang; Cheng Chung Jaing; Ching Long Cheng; Cheng Chung Lee; Hung Sen Wei; Chien Cheng Kuo

doi:10.1364/AO.56.00C140

Varying stress of SiO_xC_y thin films deposited by plasma polymerization

Wei Bo Liao, Ya Chen Chang, Cheng Chung Jaing, Ching Long Cheng, Cheng Chung Lee, Hung Sen Wei, Chien Cheng Kuo

Department of Optics and Photonics

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

SiO_xC_y thin films were deposited by plasma polymerization. The stress of the deposited SiO_xC_y thin films can be modified by adjusting the beam current, the anode voltage, and the flow rate of hexamethyldisiloxane (HMDSO) gas and oxygen. Reducing the beam current or increasing the flow rate of HMDSO gas increased the linear/cage structure ratio and turned the stress of the SiO_xC_y thin films from compressive to tensile. The linear/cage structure ratio can be adjusted by changing the composite parameter, W[FM]_c/[FM]_m, to control the stress of the deposited plasma polymer films. Multilayers of TiO₂/SiO₂/TiO₂ were coated on a SiO_xC_y plasma polymer film herein, reducing their stress by 70% from 0.06 to 0.018 GPa. The refractive index is 1.55, and the absorption coefficient is less than 10^-4 at 550 nm of the SiO_xC_y films. Superior optical performances of SiO_xC_y thin films make their use in optical thin films.

Original language	English
Pages (from-to)	C140-C144
Journal	Applied Optics
Volume	56
Issue number	4
DOIs	https://doi.org/10.1364/AO.56.00C140
State	Published - 1 Feb 2017

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title = "Varying stress of SiOxCy thin films deposited by plasma polymerization",

abstract = "SiOxCy thin films were deposited by plasma polymerization. The stress of the deposited SiOxCy thin films can be modified by adjusting the beam current, the anode voltage, and the flow rate of hexamethyldisiloxane (HMDSO) gas and oxygen. Reducing the beam current or increasing the flow rate of HMDSO gas increased the linear/cage structure ratio and turned the stress of the SiOxCy thin films from compressive to tensile. The linear/cage structure ratio can be adjusted by changing the composite parameter, W[FM]c/[FM]m, to control the stress of the deposited plasma polymer films. Multilayers of TiO2/SiO2/TiO2 were coated on a SiOxCy plasma polymer film herein, reducing their stress by 70% from 0.06 to 0.018 GPa. The refractive index is 1.55, and the absorption coefficient is less than 10-4 at 550 nm of the SiOxCy films. Superior optical performances of SiOxCy thin films make their use in optical thin films.",

author = "Liao, {Wei Bo} and Chang, {Ya Chen} and Jaing, {Cheng Chung} and Cheng, {Ching Long} and Lee, {Cheng Chung} and Wei, {Hung Sen} and Kuo, {Chien Cheng}",

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T1 - Varying stress of SiOxCy thin films deposited by plasma polymerization

AU - Liao, Wei Bo

AU - Chang, Ya Chen

AU - Jaing, Cheng Chung

AU - Cheng, Ching Long

AU - Lee, Cheng Chung

AU - Wei, Hung Sen

AU - Kuo, Chien Cheng

PY - 2017/2/1

Y1 - 2017/2/1

N2 - SiOxCy thin films were deposited by plasma polymerization. The stress of the deposited SiOxCy thin films can be modified by adjusting the beam current, the anode voltage, and the flow rate of hexamethyldisiloxane (HMDSO) gas and oxygen. Reducing the beam current or increasing the flow rate of HMDSO gas increased the linear/cage structure ratio and turned the stress of the SiOxCy thin films from compressive to tensile. The linear/cage structure ratio can be adjusted by changing the composite parameter, W[FM]c/[FM]m, to control the stress of the deposited plasma polymer films. Multilayers of TiO2/SiO2/TiO2 were coated on a SiOxCy plasma polymer film herein, reducing their stress by 70% from 0.06 to 0.018 GPa. The refractive index is 1.55, and the absorption coefficient is less than 10-4 at 550 nm of the SiOxCy films. Superior optical performances of SiOxCy thin films make their use in optical thin films.

AB - SiOxCy thin films were deposited by plasma polymerization. The stress of the deposited SiOxCy thin films can be modified by adjusting the beam current, the anode voltage, and the flow rate of hexamethyldisiloxane (HMDSO) gas and oxygen. Reducing the beam current or increasing the flow rate of HMDSO gas increased the linear/cage structure ratio and turned the stress of the SiOxCy thin films from compressive to tensile. The linear/cage structure ratio can be adjusted by changing the composite parameter, W[FM]c/[FM]m, to control the stress of the deposited plasma polymer films. Multilayers of TiO2/SiO2/TiO2 were coated on a SiOxCy plasma polymer film herein, reducing their stress by 70% from 0.06 to 0.018 GPa. The refractive index is 1.55, and the absorption coefficient is less than 10-4 at 550 nm of the SiOxCy films. Superior optical performances of SiOxCy thin films make their use in optical thin films.

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U2 - 10.1364/AO.56.00C140

DO - 10.1364/AO.56.00C140

M3 - 期刊論文

C2 - 28158060

AN - SCOPUS:85011649694

SN - 1559-128X

VL - 56

SP - C140-C144

JO - Applied Optics

JF - Applied Optics

IS - 4

ER -

Varying stress of SiOxCy thin films deposited by plasma polymerization

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Varying stress of SiO_xC_y thin films deposited by plasma polymerization